Dynamic Motion Control
for wafer stages
Wafer stages need to perform ever larger and faster movements to increase efficiency and throughput of the production process. Furthermore, single digit nanometer precision is required to ensure dense circuit patterns. This requirements can only be achieved by utilizing ultra precise displacement sensors for closed loop motion control of the stage. Thereby, occurring deviations can be compensated instantly.
However, finding a measurement device which offers real-time position tracking for such demanding movements and can be operated in vacuum & clean room conditions is a challenging task.
attocube´s laser interferometer IDS3010 enables metrology tools to achieve the required precision at nanometer range over long distances up to 5 meters with a target velocity of up to 2 m/s.
The miniaturized and light weight sensor heads can be integrated directly into the wafer stage. This reduces the moving mass significantly compared to stage attached mirrors.