Beam Aperture & Filter Positioning
in lithography and metrology processes
In lithography and metrology processes, the precise alignment and filtering of the beam is directly related to the wafer´s quality. The laser beam produces photons that are collected via a gathering mirror and directed via different apertures to hit, e.g. the reflection mask.
attocube´s nanopositioners are designed to operate with low particle generation at high temperatures and vacuum with nanometer precision. These features make them the perfect choice for reliable aperture control under extreme conditions.
- nanometer precision
- UHV compatibility up to 5e-11 mbar
- course & fine movement